Furnace and rapid thermal crystallization of amorphous Ge x Si 1-x and Si for thin film transistors

By Rem J.B.   De Leuw M.C.V.   Verweij J.F.   Holleman J.  

Thin Solid Films, Vol. 296, Iss. 1, 1997-03 ,pp. : 152-156

Elsevier

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Formation of Ge nanocrystals in amorphous GeO x and SiGeO x alloy films

By Zacharias M.   Blasing J.   Lohmann M.   Christen J.  

Thin Solid Films, Vol. 278, Iss. 1, 1996-05 ,pp. : 32-36

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Role of hydrogen during Si capping of strained Ge or Si 1-x Ge x hut clusters

By Dentel D.   Bischoff J.L.   Kubler L.   Bolmont D.  

Thin Solid Films, Vol. 336, Iss. 1, 1998-12 ,pp. : 49-52

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Thermal stability and crystallization of amorphous Si 1-x B x , Si 1-x P x and Si 1-x Sb x alloy thin films

By Carlsson J.R.A.   Sundgren J.-E.   Madsen L.D.   Hentzell H.T.G.   Li X.-H.  

Thin Solid Films, Vol. 300, Iss. 1, 1997-05 ,pp. : 51-58

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Enhancement of bulk nucleation in a-Si 1-x Ge x on SiO 2 for low-temperature solid-phase crystallization

By Sadoh T.   Tsunoda I.   Nagata T.   Kenjo A.   Miyao M.  

Thin Solid Films, Vol. 427, Iss. 1, 2003-03 ,pp. : 96-100

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