Furnace and rapid thermal crystallization of amorphous Ge x Si 1-x and Si for thin film transistors

Author: Rem J.B.   De Leuw M.C.V.   Verweij J.F.   Holleman J.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.296, Iss.1, 1997-03, pp. : 152-156

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Abstract