The effect of nitrogen content on the structure and mechanical properties of TiN films produced by magnetron sputtering

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Vacuum, Vol. 47, Iss. 5, 1996-05 ,pp. : 425-431

Elsevier

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Phase transition and properties of Ti-Al-N thin films prepared by r.f.-plasma assisted magnetron sputtering

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Electrical properties of Ge-Au films prepared by magnetron sputtering

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Effects of nitrogen flow rates on the growth morphology of TiAlN films prepared by an rf-reactive sputtering technique

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Properties of indium tin oxide films with indium tin modulation layers prepared by nano-scale controlled reactive magnetron sputtering

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