Silicon nitride and oxynitride deposition by RT-LPCVD

Author: Semmache B.   Lemiti M.   Chaneliere C.   Dubois C.   Sibai A.   Laugier A.   Canut B.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.296, Iss.1, 1997-03, pp. : 32-36

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract