Charge trapping behaviour in deposited and grown thin metal-oxide-semiconductor gate dielectrics

Author： Ramgopal Rao V.   Hansch W.   Baumgartner H.   Eisele I.   Sharma D.K.   Vasi J.   Grabolla T.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.296, Iss.1, 1997-03, pp. : 37-40

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