Yttria-stabilized zirconia thin films grown by r.f. magnetron sputtering from an oxide target

By Tomaszewski H.   Haemers J.   De Roo N.   Denul J.   De Gryse R.  

Thin Solid Films, Vol. 293, Iss. 1, 1997-01 ,pp. : 67-74

Elsevier

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Yttria-stabilized zirconia thin films grown by reactive r.f. magnetron sputtering

By Tomaszewski H.   Haemers J.   Denul J.   De Roo N.   De Gryse R.  

Thin Solid Films, Vol. 287, Iss. 1, 1996-10 ,pp. : 104-109

Elsevier

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Erratum: ''Yttria-stabilized zirconia thin films grown by r.f. magnetron sputtering from an oxide target'' (Thin Solid Films (1997) 293 (67-74))

By Tomaszewski H.   Haemers J.   De Roo N.   Denul J.   De Gryse R.  

Thin Solid Films, Vol. 305, Iss. 1, 1997-08 ,pp. : 358-358

Elsevier

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Influence of substrate temperature and target composition on the properties of yttria-stabilized zirconia thin films grown by r.f. reactive magnetron sputtering

By Boulouz M.   Boulouz A.   Giani A.   Boyer A.  

Thin Solid Films, Vol. 323, Iss. 1, 1998-06 ,pp. : 85-92

Elsevier

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Yttria-stabilized zirconia (YSZ) heteroepitaxially grown on Si substrates by reactive sputtering

By Hata T.   Sasaki K.   Ichikawa Y.   Sasaki K.  

Vacuum, Vol. 59, Iss. 2, 2000-11 ,pp. : 381-389

Elsevier

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