Statistical approach for optimizing sputtering conditions of highly oriented aluminum nitride thin films

Author： Akiyama M.   Xu C.-N.   Nonaka K.   Shobu K.   Watanabe T.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.315, Iss.1, 1998-03, pp. : 62-65

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