Copper nitride thin films prepared by reactive radio-frequency magnetron sputtering

By Nosaka T.   Yoshitake M.   Okamoto A.   Ogawa S.   Nakayama Y.  

Thin Solid Films, Vol. 348, Iss. 1, 1999-07 ,pp. : 8-13

Elsevier

Access to resources Recommend Favorite

Aluminium nitride thin films deposited by DC reactive magnetron sputtering

By Dimitrova V.   Manova D.   Paskova T.   Uzunov T.   Ivanov N.   Dechev D.  

Vacuum, Vol. 51, Iss. 2, 1998-10 ,pp. : 161-164

Elsevier

Access to resources Recommend Favorite

Synthesis and characterization of single and multilayer boron nitride and boron carbide thin films grown by magnetron sputtering of boron carbide

By Guruz M.U.   Dravid V.P.   Chung Y.W.  

Thin Solid Films, Vol. 414, Iss. 1, 2002-07 ,pp. : 129-135

Elsevier

Access to resources Recommend Favorite

Deposition time influence on cubic boron nitride thin films by tuned rf magnetron sputtering

By Gimeno S.   Munoz J.C.   Lousa A.  

Thin Solid Films, Vol. 317, Iss. 1, 1998-04 ,pp. : 376-379

Elsevier

Access to resources Recommend Favorite

Hydrogenated aluminum nitride thin films prepared by r.f. reactive sputtering. Infrared and structural properties

By Despax B.   Loretz J.C.   Marti P.   Mazel A.  

Thin Solid Films, Vol. 265, Iss. 1, 1995-09 ,pp. : 15-21

Elsevier

Access to resources Recommend Favorite