Use of Auger- and photoelectron lines in the identification of chemical states of novel ternary Ti-Al-O films prepared by reactive magnetron sputtering ion plating

Author： von Richthofen A.   Cremer R.   Domnick R.   Neuschutz D.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.315, Iss.1, 1998-03, pp. : 66-71

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