In-situ analysis of particle contamination in magnetron sputtering processes

Author: Selwyn G.S.   Weiss C.A.   Sequeda F.   Huang C.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.317, Iss.1, 1998-04, pp. : 85-92

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Abstract