Effect of d.c. bias on the deposition rate using r.f.-d.c. coupled magnetron sputtering for SnN x thin films

By Kamei R.   Migita T.   Tanaka T.   Kawabata K.  

Vacuum, Vol. 59, Iss. 2, 2000-11 ,pp. : 764-770

Elsevier

Access to resources Recommend Favorite

Phase transition and properties of Ti-Al-N thin films prepared by r.f.-plasma assisted magnetron sputtering

By Zhou M.   Makino Y.   Nose M.   Nogi K.  

Thin Solid Films, Vol. 339, Iss. 1, 1999-02 ,pp. : 203-208

Elsevier

Access to resources Recommend Favorite

Preparation of argon-free refractory thin films using RF-DC coupled magnetron sputtering

By Petrov P.K.   Hollmann E.K.   Volpyas V.A.   Volpyas A.V.   Tanaka T.   Kawabata K.  

Vacuum, Vol. 53, Iss. 1, 1999-05 ,pp. : 37-39

Elsevier

Access to resources Recommend Favorite

Influence of He, Ne and Kr addition in reactive Ar/N 2 dc magnetron plasma on TiN deposition

By Braic M.   Zoita C.N.   Braic V.   Kiss A.   Popescu M.   Musa G.  

Vacuum, Vol. 53, Iss. 1, 1999-05 ,pp. : 41-45

Elsevier

Access to resources Recommend Favorite

Structure and composition of (Ti, Al)N films prepared by r.f. planar magnetron sputtering using a composite target

By Inoue S.   Uchida H.   Koterazawa K.   Hioki A.   Howson R.P.  

Thin Solid Films, Vol. 271, Iss. 1, 1995-12 ,pp. : 15-18

Elsevier

Access to resources Recommend Favorite