Growth rate and microstructure of copper thin films deposited with metal-organic chemical vapor deposition from hexafluoroacetylacetonate copper(I) allyltrimethylsilane

Author： Son J.-H.   Park M.-Y.   Rhee S.-W.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.335, Iss.1, 1998-11, pp. : 229-236

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