Selective chemical vapor deposition of copper using (hfac) copper(I) vinyltrimethylsilane in the absence and presence of water

By Gelatos A.V.   Mogab C.J.   Marsh R.   Kodas E.T.T.   Jain A.   Hampden-Smith M.J.  

Thin Solid Films, Vol. 262, Iss. 1, 1995-06 ,pp. : 52-59

Elsevier

Access to resources Recommend Favorite

Effect of the pressure on the chemical vapor deposition of copper from copper hexafluoroacetylacetonate trimethylvinylsilane

By Lee W.-J.   Rha S.-K.   Lee S.-Y.   Park C.-O.   Kim D.-W.  

Thin Solid Films, Vol. 305, Iss. 1, 1997-08 ,pp. : 254-258

Elsevier

Access to resources Recommend Favorite

Growth rate and microstructure of copper thin films deposited with metal-organic chemical vapor deposition from hexafluoroacetylacetonate copper(I) allyltrimethylsilane

By Son J.-H.   Park M.-Y.   Rhee S.-W.  

Thin Solid Films, Vol. 335, Iss. 1, 1998-11 ,pp. : 229-236

Elsevier

Access to resources Recommend Favorite

(hfac)Cu(I)(MP) (hfac=hexafluoroacetylacetonate, MP=4-methyl-1-pentene) and (hfac)Cu(I)(DMB) (DMB=3,3-dimethyl-1-butene) for the chemical vapor deposition of copper film

By Kang S.-W.   Han S.-H.   Rhee S.-W.  

Thin Solid Films, Vol. 350, Iss. 1, 1999-08 ,pp. : 10-13

Elsevier

Access to resources Recommend Favorite

Selective deposition of anatase and rutile films by KrF laser chemical vapor deposition from titanium isopropoxide

By Watanabe A.   Tsuchiya T.   Imai Y.  

Thin Solid Films, Vol. 406, Iss. 1, 2002-03 ,pp. : 132-137

Elsevier

Access to resources Recommend Favorite