Structure of polycrystalline silicon films deposited at low temperature by plasma CVD on substrates exposed to different plasma

Author： Moniruzzaman S.   Inokuma T.   Kurata Y.   Takenaka S.   Hasegawa S.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.337, Iss.1, 1999-01, pp. : 27-31

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