Chemical and electrical characteristics of low temperature plasma enhanced CVD silicon oxide films using Si 2 H 6 and N 2 O

Author: Song J.   Lee G.S.   Ajmera P.K.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.270, Iss.1, 1995-12, pp. : 512-516

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Abstract