Formation and characterization of the fluorocarbonated-SiO 2 films by O 2 /FTES-helicon plasma chemical vapor deposition

Author： Oh K.S. Kang M.S. Lee K.-M. Kim D.S. Choi C.K. Yun S.M. Chang H.Y. Kim K.H.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.345, Iss.1, 1999-05, pp. : 45-49

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