In-situ IR and spectroscopic ellipsometric analysis of growth process and structural properties of Ti 1-x Nb x O 2 thin films by metal-organic chemical vapor deposition

Author: Gao Y.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.346, Iss.1, 1999-06, pp. : 73-81

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Abstract