A comparative study of oxygen/organosilicon plasmas and thin SiO x C y H z films deposited in a helicon reactor

Author: Aumaille K.   Vallee C.   Granier A.   Goullet A.   Gaboriau F.   Turban G.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.359, Iss.2, 2000-01, pp. : 188-196

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Abstract