Chemical kinetics in chemical vapor deposition: growth of silicon dioxide from tetraethoxysilane (TEOS)

Author: Coltrin M.E.   Ho P.   Moffat H.K.   Buss R.J.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.365, Iss.2, 2000-04, pp. : 251-263

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract