Segregation and diffusion of impurities from doped Si 1-x Ge x films into silicon

Author: Kobayashi S.   Aoki T.   Mikoshiba N.   Sakuraba M.   Matsuura T.   Murota J.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.369, Iss.1, 2000-07, pp. : 222-225

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Abstract