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Effects of double bonding configurations on thermal stability of low-hydrogen concentration fluorinated amorphous carbon thin-films with low dielectric constant prepared by sputtering with hydrogen dilution

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Optical characterization of hydrogenated amorphous carbon (a-C:H) thin films deposited from methane plasma

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Precursor selection for plasma deposited fluorinated amorphous carbon films

By Mountsier T.W.   Samuels J.A.  

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Plasma deposition of amorphous carbon films from CH 4 atmospheres highly diluted in Ar

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