Plasma enhanced chemical vapor deposition of thermally stable and low-dielectric-constant fluorinated amorphous carbon films using low-global-warming-potential gas C 5 F 8

Author： Shirafuji T.   Kamisawa A.   Shimasaki T.   Hayashi Y.   Nishino S.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.374, Iss.2, 2000-10, pp. : 256-261

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