Author: Volpi F. Portavoce A. Ronda A. Shi Y. Gay J.M. Berbezier I.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.380, Iss.1, 2000-12, pp. : 46-50
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
STM study of step graded Si 1-x Ge x /Si(001) buffers
By Kummer M. Vogeli B. Von Kanel H.
Thin Solid Films, Vol. 336, Iss. 1, 1998-12 ,pp. :
Evolution of Ge/Si(001) islands upon oxidation and water etching
By Liu C.-P.
Thin Solid Films, Vol. 415, Iss. 1, 2002-08 ,pp. :
By Markov V.A. Cheng H.H. Chia C.-t. Nikiforov A.I. Cherepanov V.A. Pchelyakov O.P. Zhuravlev K.S. Talochkin A.B. McGlynn E. Henry M.O.
Thin Solid Films, Vol. 369, Iss. 1, 2000-07 ,pp. :