Solid-phase crystallization of amorphous SiGe films deposited by LPCVD on SiO 2 and glass

By Olivares J.   Rodrguez A.   Sangrador J.   Rodrguez T.   Ballesteros C.   Kling A.  

Thin Solid Films, Vol. 337, Iss. 1, 1999-01 ,pp. : 51-54

Elsevier

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Raman spectroscopy study of amorphous SiGe films deposited by low pressure chemical vapor deposition and polycrystalline SiGe films obtained by solid-phase crystallization

By Olivares J.   Martn P.   Rodrguez A.   Sangrador J.   Jimenez J.   Rodrguez T.  

Thin Solid Films, Vol. 358, Iss. 1, 2000-01 ,pp. : 56-61

Elsevier

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Ge-induced enhancement of solid-phase crystallization of Si on SiO 2

By Yamaguchi S.   Park S.-k.   Sugii N.   Nakagawa K.   Miyao M.  

Thin Solid Films, Vol. 369, Iss. 1, 2000-07 ,pp. : 195-198

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Investigation on solid phase epitaxy of deposited SiGe film on a Si substrate

By Qi W.-J.   Li B.-Z.   Jiang G.-B.   Gu Z.-G.   Kwok T.K.   Chu P.K.   Zhang R.J.  

Thin Solid Films, Vol. 293, Iss. 1, 1997-01 ,pp. : 310-314

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Structural disorder in SiGe films grown epitaxially on Si by ion beam sputter deposition

By Parnis D.   Zolotoyabko E.   Kaplan W.D.   Eizenberg M.   Mosleh N.   Meyer F.   Schwebel C.  

Thin Solid Films, Vol. 294, Iss. 1, 1997-02 ,pp. : 64-68

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