Oxynitridation of silicon with nitrogen plasma for flash memory applications characterized by high frequency capacitance-voltage measurements

Author： Ikeda A.   Abd Elnaby M.   Fujimura T.   Hattori R.   Kuroki Y.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.385, Iss.1, 2001-04, pp. : 215-219

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