A study on the formation and characteristics of the Si&unknown;O&unknown;C&unknown;H composite thin films with low dielectric constant for advanced semiconductor devices

Author： Yang C.S.   Oh K.S.   Ryu J.Y.   Kim D.C.   Shou-Yong J.   Choi C.K.   Lee H.-J.   Um S.H.   Chang H.Y.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.390, Iss.1, 2001-06, pp. : 113-118

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