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Vacuum, Vol. 66, Iss. 3, 2002-08 ,pp. : 263-267

Elsevier

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Preparation of ZnF 2 and ZnF 2 -BaF 2 thin films by electron cyclotron resonance plasma-enhanced chemical vapor deposition

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Thin Solid Films, Vol. 358, Iss. 1, 2000-01 ,pp. : 99-103

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Characteristics of zinc oxide thin films prepared by r.f. magnetron-mode electron cyclotron resonance sputtering

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Thin Solid Films, Vol. 257, Iss. 1, 1995-02 ,pp. : 22-27

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Compositional and structural studies of amorphous silicon-nitrogen alloys deposited at room temperature using a sputtering-type electron cyclotron resonance microwave plasma

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Philosophical Magazine B, Vol. 79, Iss. 1, 1999-01 ,pp. : 137-148

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Growth processes of dielectric thin films in a multipolar microwave plasma excited by distributed electron cyclotron resonance using tetraethylorthosilicate (TEOS) and oxygen precursors

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Thin Solid Films, Vol. 289, Iss. 1, 1996-11 ,pp. : 170-176

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