Hot-wire chemical vapor deposition (HWCVD) of fluorocarbon and organosilicon thin films

Author: Lau K.K.S.   Pryce Lewis H.G.   Limb S.J.   Kwan M.C.   Gleason K.K.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.395, Iss.1, 2001-09, pp. : 288-291

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract