Author: Lau K.K.S. Pryce Lewis H.G. Limb S.J. Kwan M.C. Gleason K.K.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.395, Iss.1, 2001-09, pp. : 288-291
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
By Moutinho H.R. Jiang C.-S. Perkins J. Xu Y. Nelson B.P. Jones K.M. Romero M.J. Al-Jassim M.M.
Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. :
Poly-crystalline silicon thin films prepared by plasma-assisted hot-wire chemical vapor deposition
By Liu F. Zhu M. Liu J. Wang L.
Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. :
Thin-film transistors deposited by hot-wire chemical vapor deposition
By Stannowski B. Rath J.K. Schropp R.E.I.
Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. :
Fabrication of amorphous carbon nitride films by hot-wire chemical vapor deposition
By Yokomichi H. Masuda A. Kishimoto N.
Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. :