Improvement of the SiO 2 /Si interface characteristics by two-step deposition with intermediate plasma treatment using N 2 /He or O 2 /He gas

Author： Yi C. Kim H.U. Rhee S.W.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.408, Iss.1, 2002-04, pp. : 252-259

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