New control method of low deposition temperature limit of metal-organic chemical vapor deposition (MOCVD) by the introduction of organic vapor-Application to SrRuO 3 film preparation

Author： Higashi N.   Murakami Y.   Machida H.   Seki S.   Sawada Y.   Funakubo H.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.409, Iss.1, 2002-04, pp. : 33-36

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