IR characterization of a-C:H:N films sputtered in Ar/CH 4 /N 2 plasma

By Lazar G.   Lazar I.  

Journal of Non-Crystalline Solids, Vol. 331, Iss. 1, 2003-12 ,pp. : 70-78

Elsevier

Access to resources Recommend Favorite

Synthesis of Sn-doped a-C:H films by RF plasma-enhanced chemical vapor deposition and their characterization

By Inoue Y.   Komoguchi T.   Nakata H.   Takai O.  

Thin Solid Films, Vol. 322, Iss. 1, 1998-06 ,pp. : 41-45

Elsevier

Access to resources Recommend Favorite

Plasma deposition of amorphous carbon films from CH 4 atmospheres highly diluted in Ar

By Jacobsohn L.G.   Capote G.   Cruz N.C.   Zanatta A.R.   Freire Jr. F.L.  

Thin Solid Films, Vol. 419, Iss. 1, 2002-11 ,pp. : 46-53

Elsevier

Access to resources Recommend Favorite

Dust particle formation in low pressure Ar/CH 4 and Ar/C 2 H 2 discharges used for thin film deposition

By Berndt J.   Hong S.   Kovacevic E.   Stefanovic I.   Winter J.  

Vacuum, Vol. 71, Iss. 3, 2003-05 ,pp. : 377-390

Elsevier

Access to resources Recommend Favorite

Influence of the power and pressure on the growth rate and refractive index of a-C:H thin films deposited by r.f. plasma-enhanced chemical vapour deposition

By Benmassaoud A.A.   Paynter R.W.  

Thin Solid Films, Vol. 287, Iss. 1, 1996-10 ,pp. : 125-129

Elsevier

Access to resources Recommend Favorite