![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Author: Mahfoz-Kotb H. Salaun A.C. Mohammed-Brahim T. Le Bihan F. El-Marssi M.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.427, Iss.1, 2003-03, pp. : 422-426
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Growth of polycrystalline silicon thin films on glass
By Akasaka T. He D. Miyamoto Y. Kitazawa N. Shimizu I.
Thin Solid Films, Vol. 296, Iss. 1, 1997-03 ,pp. :
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Polycrystalline silicon thin films grown by dc arc discharge ion plating
By Yoshida M. Saida T. Okada S. Akamatsu M. Kondo K.
Thin Solid Films, Vol. 335, Iss. 1, 1998-11 ,pp. :
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Structural evaluation of polycrystalline silicon thin films by hot-wire-assisted PECVD
By Feng Y. Zhu M. Liu F. Liu J. Han H. Han Y.
Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. :