Nitrogen dilution effects on structural and electrical properties of hot-wire-deposited a-SiN:H films for deep-sub-micron CMOS technologies

Author: Waghmare P.C.   Patil S.B.   Kumbhar A.A.   Rao R.   Dusane R.O.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.430, Iss.1, 2003-04, pp. : 189-191

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