Thin-film transistors deposited by hot-wire chemical vapor deposition

By Stannowski B.   Rath J.K.   Schropp R.E.I.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 220-225

Elsevier

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High-rate deposition of amorphous silicon films using hot-wire CVD with a coil-shaped filament

By Povolny H.S.   Deng X.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 125-129

Elsevier

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The influence of different catalyzers in hot-wire CVD for the deposition of polycrystalline silicon thin films

By van Veenendaal P.A.T.T.   Gijzeman O.L.J.   Rath J.K.   Schropp R.E.I.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 194-197

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Monte Carlo simulations on large-area deposition of amorphous silicon by hot-wire CVD

By Pfluger A.   Schroder B.   Bart H.-J.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 73-77

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Hydrogen distribution, nanostructures and optical properties of high deposition rate hot-wire CVD a-Si:H

By Baugh J.   Wang K.   Han D.   Wu Y.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 95-99

Elsevier

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