Application of hot-wire chemical vapor-deposited Si:H films in thin film transistors and solar cells

By Rath J.K.   Stannowski B.   van Veenendaal P.A.T.T.   van Veen M.K.   Schropp R.E.I.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 320-329

Elsevier

Access to resources Recommend Favorite

Amorphous and microcrystalline silicon deposited by hot-wire chemical vapor deposition at low substrate temperatures: application to devices and thin-film microelectromechanical systems

By Conde J.P.   Alpuim P.   Boucinha M.   Gaspar J.   Chu V.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 105-111

Elsevier

Access to resources Recommend Favorite

Analysis of bias stress on thin-film transistors obtained by Hot-Wire Chemical Vapour Deposition

By Dosev D.K.   Puigdollers J.   Orpella A.   Voz C.   Fonrodona M.   Soler D.   Marsal L.F.   Pallares J.   Bertomeu J.   Andreu J.   Alcubilla R.  

Thin Solid Films, Vol. 383, Iss. 1, 2001-02 ,pp. : 307-309

Elsevier

Access to resources Recommend Favorite

Hot-wire silicon nitride for thin-film transistors

By Stannowski B.   Rath J.K.   Schropp R.E.I.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 339-342

Elsevier

Access to resources Recommend Favorite

Effects of dilution ratio and seed layer on the crystallinity of microcrystalline silicon thin films deposited by hot-wire chemical vapor deposition

By Moutinho H.R.   Jiang C.-S.   Perkins J.   Xu Y.   Nelson B.P.   Jones K.M.   Romero M.J.   Al-Jassim M.M.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 135-140

Elsevier

Access to resources Recommend Favorite