Fabrication of amorphous carbon nitride films by hot-wire chemical vapor deposition

By Yokomichi H.   Masuda A.   Kishimoto N.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 249-252

Elsevier

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Preparation of silicon-carbon alloy films by hot-wire CVD and their properties

By Itoh T.   Katoh Y.   Fujiwara T.   Fukunaga K.   Nonomura S.   Nitta S.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 240-243

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Hot-wire silicon nitride for thin-film transistors

By Stannowski B.   Rath J.K.   Schropp R.E.I.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 339-342

Elsevier

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Quantitative analysis of tungsten, oxygen and carbon concentrations in the microcrystalline silicon films deposited by hot-wire CVD

By Bouree J.E.   Guillet J.   Grattepain C.   Chaumont J.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 110-115

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Hot-wire chemical vapor deposition of carbon nanotubes

By Dillon A.C.   Mahan A.H.   Alleman J.L.   Heben M.J.   Parilla P.A.   Jones K.M.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 292-295

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