Effects of annealing on X-ray-amorphous CVD W-Si-N barrier layer materials

By Gokce O.H.   Amin S.   Ravindra N.M.   Szostak D.J.   Paff R.J.   Fleming J.G.   Galewski C.J.   Shallenberger J.   Eby R.  

Thin Solid Films, Vol. 353, Iss. 1, 1999-09 ,pp. : 149-156

Elsevier

Access to resources Recommend Favorite

Properties of palladium silicide thin films obtained by vacuum rapid thermal annealing of r.f. sputtered Pd films on Si

By Beshkov G.   Dimitrov D.B.   Koprinarova J.   Gesheva K.  

Vacuum, Vol. 51, Iss. 2, 1998-10 ,pp. : 177-180

Elsevier

Access to resources Recommend Favorite

Effect of vacuum rapid thermal annealing on the properties of SiN x films

By Beshkov G.   Dimitrov D.B.   Velchev N.   Petrov P.   Ivanov B.   Zambov L.   Dimitrova T.  

Vacuum, Vol. 58, Iss. 2, 2000-08 ,pp. : 509-515

Elsevier

Access to resources Recommend Favorite

Structural, morphological and acoustic properties of AlN thick films sputtered on Si(001) and Si(111) substrates at low temperature

By Caliendo C.   Imperatori P.   Cianci E.  

Thin Solid Films, Vol. 441, Iss. 1, 2003-09 ,pp. : 32-37

Elsevier

Access to resources Recommend Favorite

Nitrogen doping of fluorinated amorphous carbon thin films: structural and optical properties evolution upon thermal annealing

By Valentini L.   Braca E.   Kenny J.M.   Fedosenko G.   Engemann J.   Lozzi L.   Santucci S.  

Thin Solid Films, Vol. 408, Iss. 1, 2002-04 ,pp. : 291-296

Elsevier

Access to resources Recommend Favorite