Control of Cl 2 plasma by electron-beam-excited plasma and poly-Si etching

Author: Mikawa Y.   Miyano R.-i.   Inaguma J.-i.   Shiraki Y.   Mutsuga F.   Fujii M.   Ikezawa S.  

Publisher: Elsevier

ISSN: 0042-207X

Source: Vacuum, Vol.51, Iss.4, 1998-12, pp. : 531-535

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Abstract