Author: Tominaga K. Ao T. Sato Y. Mori I. Kusaka K. Hanabusa T.
Publisher: Elsevier
ISSN: 0042-207X
Source: Vacuum, Vol.51, Iss.4, 1998-12, pp. : 549-553
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Study of reactive DC magnetron sputtering deposition of AlN thin films
By Dechev D.A. Dimitrova V.I. Manova D.I.
Vacuum, Vol. 49, Iss. 3, 1998-03 ,pp. :
Magnetron sputtering system stabilisation for high rate deposition of AlN films
By Akhmatov V. Fomin A.A. Selishchev S.V.
Vacuum, Vol. 49, Iss. 3, 1998-03 ,pp. :