Development of a locally-electron-heated plasma source for HDP-CVD process

Author： Seki H.   Ueno Y.   Ichimura S.   Takemori S.   Uchikawa S.   Murakamia H.   Okada S.   Mochizuki Y.   Setoyama E.  

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.51, Iss.4, 1998-12, pp. : 695-697

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