Formation of 3D islands of metal oxides on silicon covered by native oxide film by multi-step ion sputtering of Ti, Nb and V

Author: Sushkova N.M.   Akimov A.G.  

Publisher: Elsevier

ISSN: 0042-207X

Source: Vacuum, Vol.56, Iss.4, 2000-03, pp. : 287-291

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract