Author： Sang H.Y. Zhang W.J. Wang T.M.
Publisher： Elsevier
ISSN： 0042-207X
Source： Vacuum, Vol.68, Iss.2, 2002-10, pp. : 203-209
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
On the hardness of a-C:H films prepared by methane plasma decomposition
By Marques F.C. Lacerda R.G. Odo G.Y. Lepienski C.M.
Thin Solid Films, Vol. 332, Iss. 1, 1998-11 ,pp. :
Access to resources
Recommend
Some growth peculiarities of a-C:H films in ECR microwave plasma
By Kulikovsky V. Shaginyan L. Jastrabik L. Soukup L. Bohac P. Musil J.
Vacuum, Vol. 60, Iss. 3, 2001-03 ,pp. :
Optical emission end point detecting for monitoring oxygen plasma a-C:H stripping
By Cescato L. Alves M.A.R. Da Silva Braga E. Fissore A.
Vacuum, Vol. 49, Iss. 3, 1998-03 ,pp. :