PECVD formation of ultrathin silicon nitride layers for CMOS technology

Author： Beck R.B.   Giedz M.   Wojtkiewicz A.   Kudla A.   Jakubowski A.  

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.70, Iss.2, 2003-03, pp. : 323-329

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