Author: Grigonis A. Knizikevicius R. Rutkuniene Z. Tribandis D.
Publisher: Elsevier
ISSN: 0042-207X
Source: Vacuum, Vol.70, Iss.2, 2003-03, pp. : 319-322
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Real dimensional simulation of anisotropic etching of silicon in CF 4 +O 2 plasma
By Knizikevicius R. Galdikas A. Grigonis A.
Vacuum, Vol. 66, Iss. 1, 2002-06 ,pp. :
Real dimensional simulation of SiO 2 etching in CF 4 +H 2 plasma
Vacuum, Vol. 65, Iss. 1, 2002-02 ,pp. :
Study of GaAs and GaInP etching in Cl 2 /Ar electron cyclotron resonance plasma
By Yoon S.F. Ng T.K. Zheng H.Q.
Thin Solid Films, Vol. 394, Iss. 1, 2001-08 ,pp. :