Formation of polymeric layer during silicon etching in CF 2 Cl 2 plasma

Author: Grigonis A.   Knizikevicius R.   Rutkuniene Z.   Tribandis D.  

Publisher: Elsevier

ISSN: 0042-207X

Source: Vacuum, Vol.70, Iss.2, 2003-03, pp. : 319-322

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Abstract