Intermediate gas phase precursors during plasma CVD of HMDSO

Author： Theirich D.   Soll C.   Leu F.   Engemann J.  

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.71, Iss.3, 2003-05, pp. : 349-359

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

What is the difference between catalytic CVD and plasma-enhanced CVD? Gas-phase kinetics and film properties

By Masuda A.   Izumi A.   Umemoto H.   Matsumura H.  

Vacuum, Vol. 66, Iss. 3, 2002-08 ,pp. : 293-297

Elsevier

Access to resources Recommend Favorite

Densification and Hydration of HMDSO Plasma Polymers

By  

PLASMA PROCESSES AND POLYMERS (ELECTRONIC), Vol. 12, Iss. 1, 2015-01 ,pp. : 32-41

John Wiley & Sons Inc

Access to resources Recommend Favorite

Phase diagrams for CVD diamond deposition from halogen-containing gas phase

By Liu Z.-J.   Zhang D.W.   Zhang J.-Y.   Wan Y.-Z.   Wang J.-T.  

Thin Solid Films, Vol. 342, Iss. 1, 1999-03 ,pp. : 42-46

Elsevier

Access to resources Recommend Favorite

HMDSO plasma polymerization and thin film optical properties

By Mota R.P.   Galvao D.   Durrant S.F.   De Moraes M.A.B.   Cantao M.   De Oliveira Dantas S.  

Thin Solid Films, Vol. 270, Iss. 1, 1995-12 ,pp. : 109-113

Elsevier

Access to resources Recommend Favorite

Deposition process of metal oxide thin films by means of plasma CVD with -diketonates as precursors

By Itoh K.-i.   Matsumoto O.  

Thin Solid Films, Vol. 345, Iss. 1, 1999-05 ,pp. : 29-33

Elsevier

Access to resources Recommend Favorite