Characteristics of MIS capacitors using Ta 2 O 5 films deposited on ZnO/p-Si

Author: Noh Y.S.   Chatterjee S.   Nandi S.   Samanta S.K.   Maiti C.K.   Maikap S.   Choi W.K.  

Publisher: Elsevier

ISSN: 0167-9317

Source: Microelectronic Engineering, Vol.66, Iss.1, 2003-04, pp. : 637-642

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Abstract