Low bias dry etching of III-nitrides in Cl 2 -based inductively coupled plasmas

Author： Cho Hyun Vartuli C. Donovan S. Mackenzie J. Abernathy C. Pearton S. Shul R. Constantine C.

ISSN： 1543-186X

Source： Journal of Electronic Materials, Vol.27, Iss.4, 1998-04, pp. : 166-170

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