Integration of high dielectric Ba 0.5 Sr 0.5 TiO 3 films into amorphous TaSiN barrier layer structures

Author： Wenger C. Albert M. Adolphi B. Heuer H. Bartha J.W. Schlenkrich F.

Publisher： Elsevier

ISSN： 1369-8001

Source： Materials Science in Semiconductor Processing, Vol.5, Iss.2, 2002-04, pp. : 233-236

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