Internal linear inductively coupled plasma (ICP) sources for large area FPD etch process applications

Author： Lee Y.J. Kim K.N. Song B.K. Yeom G.Y.

Publisher： Elsevier

ISSN： 1369-8001

Source： Materials Science in Semiconductor Processing, Vol.5, Iss.4, 2002-08, pp. : 419-423

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