Polycrystalline silicon deposited on glass by subatmospheric-pressure chemical vapour deposition at a high rate

Author: Münster Peter   Sarret Michel   Mohammed-Brahim Tayeb   Coulon Nathalie   Mevellec Jean-Yves  

Publisher: Taylor & Francis Ltd

ISSN: 1463-6417

Source: Philosophical Magazine B, Vol.82, Iss.15, 2002-10, pp. : 1695-1701

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Abstract